Researchers develop new atomic layer deposition process
A new way to deposit thin layers of atoms as a coating onto a substrate material at near room temperatures has been invented at The University of Alabama in Huntsville (UAH), a part of the University of Alabama System. UAH postdoctoral research associate Dr. Moonhyung Jang got the idea to use an ultrasonic atomization technology Read more about Researchers develop new atomic layer deposition process[…]